Wafer Stage Motion Control

Wafer manufacturing Industries uses conventional controller, but in order to control the position in sub nanometer range conventional controller is not suitable, why because Tuning and augmenting the controller becomes difficult and expensive. So a robust controller is designed for wafer manufacturing system. The controller design in this paper is performed for the translational x and y DOFs in the horizontal plane to facilitate the exposition. The trends in wafer stages are expected to lead to lightweight precision motion systems. In order to make the wafer manufacturing system more efficient and to increase its accuracy, here in this paper a comparison between H infinity and Fuzzy PI controller is designed and compare their result.